Arradiance ALD deposition system

Atomic layer deposition tool for depositing Al2O3 films onto wafers. The deposition process is fully automated and allows for a tunable deposition temperature. The Arradiance has capacity for additional ALD precursors and could be used to deposit other dielectrics (e.g. high dielectric constant materials).

Superuser:  Thomas Hazard  thazard@princeton.edu