Nano Gallery

  • Stepped impedance filter fabricated using the Heidelberg DWL66+ direct write lithography system, AJA superconducting deposition system, and SouthBay reactive ion etcher (Rohit Dilip).
  • Tilted view scanning electron microscope image of an InAs nanowire array. Nanowire growth takes place at gold catalyst sites that are fabricated using the Elionix electron beam lithography system and Sharon Vacuum evaporation system (Jiri Stehlik).
  • InAs nanowire double quantum dot formed by connecting a single InAs nanowire to thick source and drain electrodes. The double quantum dot is formed by electrically biasing the gate electrodes beneath it. Fabricated using the Elionix electron beam lithography system and Sharon Vacuum evaporation system (Jiri Stehlik).
  • Aluminum airbridges designed to electrically connect the ground planes of a Nb stripline resonator. Fabricated using the Heidelberg DWL66+ direct write lithography system and AJA superconducting deposition system (Xiao Mi).
  • Overlapping aluminum gate electrodes used to accumulate electrons in a Si/SiGe heterostructure. Fabricated using the Elionix electron beam lithography system and AJA superconducting deposition system (David Zajac).