The QDNL supports a variety of nanofabrication needs. A vapor prime oven and spinners are available for substrate preparation. Photolithography can be performed using a KarlSuss mask aligner or by using the direct-write capabilities of the Heidelberg instruments DWL66+. Thin films can be deposited using a general purpose evaporator or a dedicated AJA superconducting deposition system. The Elionix F125 electron beam lithography system is capable of multilayer lithography on piece parts or full wafers. A variety of etching and packaging tools are supported.

Scroll through the equipment list, shown on the left, to learn more about the capabilities of the QDNL.