Elionix ELS-F125 electron beam lithography system

The Elionix is a state-of-the-art 125 kV electron beam lithography system. It has a 100 MHz pattern generator and can achieve less than 10 nm overlay accuracy.  The beam current is adjustable from 50 pA to 100 nA.  There are 4 sample holders:

-Piece Holder: This can hold 2 large pieces (1.5 x 1.5 inch) and 3 small pieces (0.5 x 0.5 inch).

-Normal Cassette: This can hold full wafers.

-Mask Cassette: This can hold large rectangular pieces.

-10 mm Cassette: This has a 10 mm round hole with set screws for mounting custom pieces similar to an SEM.

It takes less than 15 minutes to load a sample using the loadlock.  The tool can be used as a scanning electron microscope for imaging and has a secondary electron detector as well as a backscattered electron detector.  A Spicer field cancellation system provides a high stability electromagnetic environment for the tool.

There are several pieces of supporting equipment for Elionix users. A Nikon prealignment stage is adjacent to the tool and allows the user to easily measure the sample alignment mark locations relative to the stage.

A Dell workstation is also located adjacent to the Elionix and can be used for file conversion. Beamer software is available to users who need to perform proximity corrected exposures.

Superuser:  David Zajac  zajac@princeton.edu